News
June 2018
The company’s Executive Manager Mr. Milko Angelov attended the Modtech 2018 Conference in
Constanta, Romania as invited lecturer. He presented his paper “Properties of TiN/CrN superlattice hard coatings deposited by reactive magnetron sputtering”.
November 2017
We delivered one 3” highly unbalanced tilted magnetron cathode with gas injection to Kaunas
University of technology, Institute of Materials Science, Lithuania.
February 2017
We delivered one MF pulsed DC magnetron power supply MPS 05 to Attophotonics Biosciences
GmbH, Wiener Neustadt, Austria.
July 2016
We delivered one PLC based control unit for automatic control of 100 kW vacuum furnace, including the thyristor control circuitry to Vactech Ltd., Apriltsi, Bulgaria.
July 2016, November 2016
We delivered two Penning vacuum gauges PNVG 01 to Nova Fabrica Ltd., Ignalina, Lithuania.
April 2016
We delivered one MF pulsed DC magnetron power supply IMPS 15 to Attophotonics Biosciences GmbH, Wiener Neustadt, Austria.
December 2015
We delivered one dual channel Pirani vacuum gauge PRVG 02 to Loreto Sixth Form College, Manchester, United Kingdom.
March 2015
We delivered one high current pole changer to Metso Automation Oy Flow Conrol, Tampere, Finland. It works together with the previously delivered 2,7 kW MF pulsed DC power supply MFPS 30M.
January 2015
We delivered one MF pulsed DC magnetron power supply MPS 10 to Vacuum Techniques Pvt. Ltd., Bangalore, India.
November 2014
We delivered one 2,7 kW MF pulsed DC power supply MFPS 30M to Metso Automation Oy Flow Conrol, Tampere, Finland.
September 2014
We delivered one dual channel Pirani vacuum gauge PRVG 02 with RS323 interface to Institute of Inorganic Chemistry, Slovak Academy of Sciences, Bratislava, Slovak Republic.
October 2013
We delivered one 2” circular planar magnetron cathode with shutter, one MF pulsed DC magnetron power supply IMPS 10 and one dual channel Pirani vacuum gauge PRVG 02 to Universidad Publica de Navarra, Pamplona, Spain.
August 2013
We delivered one high current MF pulsed DC switch, working on fixed 50 kHz in series with 10 kW DC magnetron power supply and one LN2 Meissner trap to Center for plasma technologies Plasma DOO, Skopje, Republic of Macedonia.
February 2013
We delivered one MF pulsed DC magnetron power supply MPS 10 to UAB Vildoma, Vilnius, Lithuania.
We delivered one MF pulsed DC magnetron power supply IMPS 20 to Hind High Vacuum Pvt. Ltd, Bangalore, India.
We designed, manufactured and put in operation High Vacuum System HVP 100 HRD for Nanotech Group Ltd., Plovdiv, Bulgaria. The system is designed for deposition of hard, wear resistant coatings onto cutting tools by reactive magnetron sputtering. The main advantage is the possibility for deposition of Carbon based nanocomposites and hydrogen-free a-C coatings, including nanostructured multi-layers. Pictures of the working chamber you can see here.
June 2011
We delivered an Arc Evaporation Equipment to Center for Plasma Technologies Plasma DOO, Skopje, Republic of Macedonia.
May 2011
We delivered one High Vacuum system for pulsed laser deposition to Vascotec GmbH, Gera, Germany.
December 2010
We delivered one 2" circural planar magnetron cathode to the J.E. Purkyne University, Usti nad Labem, Czech Republic
December 2010
We delivered one 500W MF Pulsed DC bias power supply to the University of Minho, Braga, Portugal
October 2010
We delivered one 4" circular planar magnetron cathode to Innovative Coatings LLC, RI, USA.
August 2010
We upgraded a previously delivered system for magnetron sputtering to be able to do reactive magnetron sputtering for our customer – Best Bijuteri San. Tic. Ltd., located in Sariyer, Istanbul, Turkey.
July 2010
The company’s Executive Manager Mr. Milko Angelov joined the fourth International Conference MPA 2010, which was held in Braga, Portugal and presented our last products – HV Systems for reactive magnetron sputtering of multi-layer stacks for decorative and optical applications. The presentation of his talk is possible to download here.
June 2010
We delivered a High Vacuum System for reactive magnetron sputtering of multi-layer optical coatings HVP 15 RMS to Optix Co JSC, Sofia, Bulgaria. The system is completely automated and it is available remote control through the Net.
October 2009
We delivered two industrial scale batch coaters, based on reactive magnetron sputtering to Vacuum Tech. Ltd., Kazanlak, Bulgaria. These coaters contain two rectangular planar cathodes with movable magnetic system, arranged in a Closed Field Unbalanced Magnetron Sputter System and two-fold planetary motion substrate holder. The monthly capacity of each coater is 10 Million pieces at three-shifted operation duty.
September 2009
We delivered three 1,0 kW MF pulsed DC magnetron power supplies MPS10M with remote control facility to Ashern Technologies Inc. Taiwan.
May 2009
The company’s Executive Manager Mr. Milko Angelov joined the second International Conference Nanohard 2009, which was held in Sozopol, Bulgaria and presented our last products.
February 2009
We delivered one Automatic Leak Valve ALV 01 to Optix Co. JSC, Sofia, Bulgaria for improving the performance of one of their optical coaters.
February 2009
We delivered one 10 kW DC magnetron power supply and two Automatic Leak Valves ALV 01 to Ewert Lac. Ltd. Strelcha, Bulgaria.
January 2009
We delivered one 2” unbalanced circular planar magnetron cathode to J. E. Purkyne University, Usti nad Labem, Czech Republic, same as previously delivered ones.
June 2008
The company's Executive Manager Mr. Milko Angelov joined the 7-th Iberian Vacuum Meeting and 5-th European Topical Conference on hard coatings, which was held in Caparica, Portugal. He presented our newest products in the field of reactive sputter deposition, such as MF pulsed DC power supplies, including our “new concept” design of pulsed only power supply, our own asymmetric bipolar technology and complete equipment for deposition of a-Carbon based multi-layers onto cardiovascular stents.
June 2008
We delivered one 5,0 kW Glow Discharge Power Supply to Titanit Ultra Sert Kaplamalar San. ve Tic. Ltd, Istanbul, Turkey. The power supply will be used for glow discharge in-situ cleaning of cutting tools prior to deposition of hard, wear-resistant coatings, such as TiN, TiCN, AlTiN, etc.
March 2008
We delivered our newly designed 2” unbalanced circular planar magnetron cathode to J. E. Purkyne University, suitable for work both with DC and RF power supplies. Pictures of this cathode you can find here.
December, 2007
The company's Executive Manager Mr. Milko Angelov joined the Symposim on Reactive Sputter Deposition RSD 2007, which was held in Leoben, Austria. He presented our newest products in the field of reactive sputter deposition, such as MF pulsed DC power supplies, our own asymmetric bipolar technology and complete equipment for deposition of a-Carbon based multi-layers onto cardiovascular stents.
November, 2007
We designed new 2" unbalanced circular planar magnetron cathode with tilting for Physics Department of University of Minho, Guimaraes, Portugal. Picture of the cathode you can find here.
November, 2007
We established a business relationship with PNS Co. Ltd., Sungnam-City, Korea with respect to develop common projects in the field of our activity, thus providing equipment and services for the Korean market. According to our agreement, PNS Co. Ltd. is our representative in Korea.
July, 2007
In co-operation with Satelite-AG Ltd, Plovdiv, we upgraded an old Kolzer's metalizer. We added one non-planar arc evaporator with rod-shaped cathode, two 24" rectangular planar magnetron cathodes and planetary motion mechanism with two stages of freedom. The system is completely automated, based on OMRON's programmable logic controller.
July, 2007
We developed two new vacuum gauge controllers, based on our modular design. Both controllers have LED digital display and show measured pressure in exponential format with three digit mantissa. One of these controllers provides adequate power supply and readout for the MKS's BARATRON 627B and second one is dual channel and works with all Active gauges of EDWARDS Vacuum (gauge identification is not provided).
May, 2007
The company's Executive Manager Mr. Milko Angelov joined the Nanohard 2007 International Scientific Conference, which was held in Velingrad, Bulgaria and presented our products with respect to use of MF pulsed power supplies for reactive sputter deposition of hard, wear resistant, gradient composition, multi-layer and nanocomposite coatings. The Presentation of his talk is possible to download here.
May, 2007
We started manufacture of new type unipolar pulsed DC magnetron power supply with improved voltage waveform - by superimposing of one short, high voltage pulse with amplitude of 900V and one longer, relatively low voltage pulse, which ensures better ionization and using of lower output inductance. This design ensures lower arc appearance probability because of better re-charging of the poisoned target areas. It works at fixed 50 kHz in pulsed mode only and was designed for reactive sputter deposition of Alumina protective layers onto metalized plastics details.
March, 2007
We re-designed our Automatic Leak Valve and now it is based on mixed signal microcontrollers only, which replaced completely the analogue controller in our previous design. Now it works faster and is more reliable.
October, 2006
We developed our own design of asymmetric bipolar MF pulsed DC power supplies for plasma applications. The frequency can be adjusted in the range 40 to 100 kHz and the duty cycle is adjusted within the range 12 to 42 %. Active arc suppression with response time as short as 0,6 us is built in. Bias and magnetron power supplies with output power up to 1 kW are available. Negative output voltage can be adjusted in the range 0 to -200V for bias applications and 0 to -600V for magnetron cathodes powering. Pictures of the pulse's shape can be seen here.
July, 2006
We developed and manufactured a complete equipment for deposition of biocompatible multi-layer coatings onto cardiovascular stents, such as TiN, TiCN, CN and a:C. It is provided substrate's heating and etching, deposition of gradient composition interlayers and deposition of smooth amorphous Carbon top layer. The overall thickness of the stack is in the range of 100 nm.
June, 2006
Two of our new 4" unbalanced circular planar magnetron cathodes with tilting possibility for improved film thickness uniformity deposition are working in closed field unbalanced magnetron sputter system at customer site. This cathode is completely immersed in vacuum and is designed for low pressure applications in the 10E-4 mbar range. The picture of the closed field unbalanced magnetron sputter system can be seen here. This picture is published with the kind permission of Department of Physics, University of Minho, Portugal.
June, 2006
We continue our co-operation with Mikropack GmbH, Germany, which now is part of Ocean Optics Inc., to represent new products at new markets and to provide our customers with complete technological solutions. More info about the Mikropack's products is possible to find at www.mikropack.de
December, 2005
Since the end of 2005 the company was re-registered as a Ltd. with the same owner and field of activity.
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