Technologies
Through these years we developed a variety of technological processes for our customers, satisfying their specific needs. Based on our knowledge and experience, we can offer many complete solutions, including design and manufacture of customer specified High Vacuum Systems for thin film deposition, supporting different deposition processes and applications. We are able to supply equipment supporting different processes, such as:
- thermal evaporation, including reactive evaporation
- magnetron sputtering and reactive magnetron sputtering
- cathodic vacuum arc evaporation and reactive cathodic arc evaporation
- triode cathode sputtering, including reactive sputtering
The main applications, we can provide, are:
- production of mirror by thermal evaporation or magnetron sputtering of Al
- three-dimensional plastics parts metallization with Al by thermal evaporation
- three-dimensional plastics or metallic parts metallization by magnetron sputtering; deposition of decorative and functional multi-layer coatings, including oxides and nitrides by reactive sputtering, metallization of plastics buttons, including barrel metallization
- production of coloured semitransparent architectural glass by deposition of interference multi-layer stacks, using reactive magnetron sputtering or reactive cathodic vacuum arc evaporation of Ti
- deposition of hard, wear resistant coatings, such as TiN, TiCN, CrN, AlTiN, AlTiN/SiN nanocomposites, etc. by reactive cathodic vacuum arc evaporation onto cutting tools, inserts, dies and forms; deposition of graded and multi-layer hard coatings
- triode cathode sputtering of CdS/CdSe compounds onto Sital substrates for production of photoconductive cells (the plasmatron for triode cathode sputtering is patented) - developed in collaboration with colleagues from Central Laboratory of Applied Physics, Department of Bulgarian Academy of Sciences, Plovdiv
- deposition of amorphous carbon (amorphous diamond) thin films by triode cathode sputtering and magnetron sputtering as a protective coatings onto high power CO2 optics - developed in collaboration with colleagues from Central Laboratory of Applied Physics, Department of Bulgarian Academy of Sciences, Plovdiv
- deposition of carbon (amorphous diamond) thin films by triode cathode sputtering and magnetron sputtering as a interface and protective scratch resistant hydrophobic coatings onto plastics ophthalmic lenses - developed in collaboration with colleagues from Central Laboratory of Applied Physics, Department of Bulgarian Academy of Sciences, Plovdiv
- web coating of PET foil by high rate magnetron sputtering of Al - developed in collaboration with ISMA Ltd., Sofia
We are able to provide our customers with all reactive processes control facilities, such as Plasma Impedance Control, Plasma Emission Monitoring (in collaboration with Mikropack GmbH, Ostfildern, Germany), flow control, etc, thus enabling multi-gas reactive processes, for example deposition of TiCN. Our magnetron power supplies and Automatic Leak Valve allow supporting of Plasma Impedance Control reactive sputter deposition of different layers, such as AlN, TiN as well TiO2, SiO2 and SiN stoichiometric films with optical properties in transition mode, allowing achieving of high deposition rates.
There is provided a possibility of gradient composition coatings deposition with controlled gradients, both by magnetron sputtering and cathodic vacuum arc evaporation. Substrate biasing and heating allow deposited films' properties modification and control. We can deliver both DC and MF pulsed power supplies with incorporated fast arc suppression circuitry, suitable for substrate pre-cleaning, implantation for achieving of increased adhesion and biasing for ion assisted deposition and increasing of reactivity probability.
